Our lab


 
Our group is equipped with a complete set of cutting-edge facilities for semiconductor device fabrication and demonstration, including crystal growth, characterization of grown crystals, device fabrication, device characterization, and construction of optical signal processing.
 
Semiconductor device fabrication
 

Molecular beam epitaxy (MBE)
 

Molecular beam epitaxy (MBE) Gen II
 

Inductively coupled plasma
reactive ion etching (ICP-RIE)
Crystal characterization
 

X-ray diffraction (XRD)
 

Photoluminescence measurement system and
super-conducting magnet
Ultrafast optical signal processing
 

Ultra-short optical pulse generator at 1.5mm
and detection systems

160Gbps optical signal multiplexer/demultipulexer
using semiconductor optical amplifiers

Materials Science Department


 
Our department, Graduate School of Materials Science, has a number of large characterization systems such as SEM and TEM, which are open for students and researchers with support from the technicians. Also, the department houses a clean room equipped with electron beam writer, stepper etc.