Research Facilities
The Division of Materials Science has been diligently working on establishing an environment conducive to advancing cutting-edge research. In particular, the foundational shared facilities and equipment have been prepared and operated by the faculty and technical staff of the Center for Materials Research Platform (CMP) since 2023 to ensure that they can support research activities in the best possible condition.
Microscopes and TEM specimen preparation instruments
A high power (300kV) electron microscope that irradiates accelerated electrons through specimens to form magnified images at sub-nanometer resolution and obtain other features.
A high power (200kV) electron microscope that irradiates accelerated electrons through specimens to form high contrast images at sub-nanometer resolution.
A device that can prepare vitrified fluid specimens for cryo-EM. It can be used for aqueous and other samples.
An ultramicrotome that can slice specimens in 50 – 100nm thicknesses. A cryo chamber for slicing soft specimens is attached.
A focused electron beam is scanned over a thin specimen. Transmitted electrons through the specimen are collected at each point on scan lines with a detector. Then, a projection image of the specimen is acquired by displaying its intensity as brightness on a monitor synchronized with the scan. A spherical aberration corrector is installed in the STEM to observe atomic resolution images.
A focused electron beam is scanned over a bulk specimen. Secondary electrons emitted from the specimen are collected at each point on scan lines by a detector. Then, an image analyzable for the surface topography of the specimen is acquired by displaying its intensity as brightness on a monitor synchronized with the scan. A field emission electron gun and an in-lens objective lens are installed in the SEM to observe high resolution images.
This system irradiates a sample with an electron beam to obtain images and information on the physical properties of the sample. Low vacuum capability, EDX and EBSD are available.
FIB enables us by scanning a focused gallium ion beam to micro-machine a sample, observe the surface topography of the sample collecting secondary electrons and locally deposit carbon or tungsten on the sample using a gas. FIB is frequently used to prepare specimens for (S)TEM.
A physical probe is scanned over a specimen to observe its surface topography and measure its physical properties. Some methods are available, such as atomic force microscopy (AFM) and friction force microscopy (FFM).
Mass spectrometers
This is a high-resolution LC/MS that can be introduced from HPLC to mass spectrometer. Available ionization methods are ESI, APCI, CSI, and DART, and the DART method can be used for direct analysis without preparation, and TLC spots can be measured directly. This mass spectrometer is specialized in organometallic complexes and self-assembled supramolecules.
This is an ultra-high resolution and high sensitivity MALDI-TOFMS with SpiralTOF ion optical system. It is a mass spectrometer that is specialized in the measurement of organic compounds and synthetic polymers.
This is a MALDI-TOF/MS with linear and reflectron modes. It is a mass spectrometer that is specialized in the measurement of organic medium-molecular weight compounds and high-molecular weight proteins.
This is a quadrupole mass spectrometer that can measure samples of various forms and conditions by simply holding them over the DART ion source without any preparation.
This is a high-resolution mass spectrometer with two introduction methods: GC/MS, which can be introduced into the mass spectrometer from GC, and direct analysis using a direct probe. The available ionization methods are EI, CI, and FAB.
X-ray diffraction instruments
Automatic multipurpose X-ray diffractometer that analyzes crystallinities of powders, thin films, and liquids with a guidance function
X-ray device to analyze the mesoscale structure of materials from X-ray scattering in a low-angle region of smaller than 10 degrees
X-ray diffractometer that analyzes the three-dimensional structure of atoms and molecules in a single crystal (～0.1 mm)
Nuclear magnetic resonance and electron spin resonance instruments
Nuclear magnetic resonance measurement are used for the invetigation of molecular structures and physical properties using a strong magnetic field superconducting magnet. Our department has two solution-measurement dedicated machines (600MHz/500MHz) and one solution/solid measurement machine (solid 400MHz).
ESR is a measurement method that selectively detects paramagnetic substances by the electron spin resonance method. Informations on reactivity, motility and structure of the paramagnetic substances can be obtained by the magnitude of the magnetic moment and the interaction with electron spins and nuclear spins.
Surface analysis instruments
The sample is irradiated with X-rays, and the intensity of the emitted photoelectrons is measured for each kinetic energy. This equipment analyzes the type, ratio, and chemical state of the elements contained in the sample.
This is an electron microprobe device that analyzes constituent elements based on the wavelength and intensity of characteristic X-rays generated by irradiating an object with an electron beam.
Optical measurement instruments
The sample is irradiated with visible laser light, and the scattered light by Raman effect is detected. It can measure the natural frequencies of molecular and lattice vibrations of a sample. It is used for sample identification and analysis of physical and chemical states.
Circular dichroism is a phenomenon in which the degree of absorption of left and right circularly polarized light differs in the absorption wavelength region of an optically active substance. This phenomenon can be used to detect changes in conformation and interactions, such as stereo-coordination.
Linearly polarized light is irradiated onto a sample and the change in polarization of the reflected light relative to the incident light at each wavelength are measured. The thickness and complex refractive index of a thin film can be obtained by fitting analysis to minimize the error between the spectrum obtained experimentally and the spectrum calculated using an idealized model of the sample.
Elemental analysis instruments
The elementary analysis device provides the information on the weight contents of carbon, hydrogen, and nitrogen in a compound by combustion decomposition. It is possible to measure not only organic compounds but also inorganic compounds and liquid samples.
A mass spectrometer that uses ICP (Inductively Coupled Plasma) as its ion source. By referring to a standard solution whose concentration is known beforehand, the concentration of an element in a sample solution can be measured with high sensitivity.
Physical properties measurement instruments
This instrument measures the electrical resistance, specific heat, thermal conductivity, and Seebeck coefficient of a sample and their temperature dependence.
Work function and ionization potential can be measured in a wide energy range (4 to 7 eV) in the atmosphere. It is also possible to measure powder and liquid samples that cannot be brought into vacuum.
A device that can measure the change over time with temperature change of various materials and physical quantities such as melting point, boiling point, and glass transition point. The differential scanning calorimeter is a heat flux type, and the simultaneous differential thermogravimetric analyzer is a horizontal differential type.
This system measures the spectral response characteristics and quantum efficiency of various types of solar cells by irradiating monochromatic light of constant energy and constant photon without wavelength dependence on the solar cell.
This is an SEM type probing system that can measure electrical characteristics and analyze electron beam absorption currents of internal wiring, materials, and electronic components of semiconductor devices.
Clean room
This equipment uses the sputtering method to form a thin film by attaching and depositing it on the surface of a substrate.
This equipment uses the sputtering method to form a thin film by attaching and depositing it on the surface of a substrate. （It is possible to flow oxygen and nitrogen.）
This system can directly draw patterns using electron beams. With a maximum acceleration voltage of 50kV, patterns of about 10nm can be drawn.
ET200 is able to trace and analyze nano-level micro figures with high accuracy, appropriate for soften sample surfaces by controlling the measuring force.