Dian Budiarti Kastian, a doctoral student from the Information Device Science Lab received the “Best Poster Award” at the 10th IEEE Electron Devices Technology and Manufacturing (EDTM) 2026.
Summary
The 10th IEEE Electron Devices Technology and Manufacturing (EDTM) 2026 was held from March 1st to 4th at Setia SPICE Convention Centre, Pulau Pinang, Malaysia. This conference is highly prestigious and competitive for presenting advanced research in semiconductor technologies that focuses on electronic devices, manufacturing, and integrated circuits. EDTM 2026 received over 500 paper submissions from 23 countries and featured 13 plenary and keynote speakers. With 9 best poster awards given out of more than 170 poster presentations, this testifies to the high levels of competition and research standards of this conference.
Presentation title
Comparative study of vacuum-deposited and solution-combustion-synthesis Al₂O₃-HfO₂ gate dielectric for a-IGZO thin-film transistors
Authors
Dian Budiarti Kastian, Juan Paolo S. Bermundo, Candell Grace Paredes Quino, Kosuke O. Hara, and Yukiharu Uraoka
Research detail
This work focuses on the development of high-quality Al₂O₃ and HfO₂ gate dielectrics using solution combustion synthesis (SCS) for a-IGZO thin-film transistors. The study investigates dielectric film formation, interface quality, and electrical performance, including leakage current, capacitance behavior, and device stability. It highlights the potential of SCS-processed to achieve low-temperature, scalable fabrication while maintaining high dielectric performance.
Comment
I am truly honored to receive the Best Poster Award at IEEE EDTM 2026. I would like to express my sincere gratitude to my supervisors, Professor Yukiharu Uraoka and Associate Prof. Juan Paolo Bermundo, for their invaluable guidance and continuous support throughout this work. I also extend my appreciation to all members and staff of the Information Device Science Laboratory for their assistance and encouragement. This recognition is deeply appreciated and motivates me to continue striving for excellence. Thank you very much.