RF Plasma CVD |
ICP-Reactive Ion Etching System |
RF Magnetron Sputtering (Oxide) |
RF Magnetron Sputtering (Si-related) |
Furnace Annealing system |
Rapid Thermal Anneal system |
Electron beam deposition system |
Resistive heating vapor deposition system |
UV Ozone system |
High pressure water vapor system |
Supercritical water vapor system |
Glove box |
Mask Aligner/Spin Coater |
Draft Chamber |
Muffle Furnace |
Atomic Layer Deposition |
Laser Doping System |
Carbon Nanotube CVD |
Screen Printing System |
Diamond CVD |
Sputter Coater |
Near-field nano-patterning system |
Ultra pure water supply |
Gas lines (O2, H2, Ar, SF6, CF4) |
Semiconductor Parameter Analyzer |
Prober (Room Temp. and High Temp.) |
Infrared Imaging System |
Digital Microscope |
Spectrophotometer |
Humidity Chamber |
Atomic force microscopy system |
Fourier-transform infrared spectroscopy |
Spectrofluorophotometer |
Four point probe system |
Emission microscope |
Vacuum low temperature prober |
Vacuum light irradiation prober |
Photocurrent / lifetime measuring device |
EBIC-SEM |
Prober (2 units) |
LCR meter |
Scanning tunneling microscope (STM) |
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