![]() RF Plasma CVD |
![]() ICP-Reactive Ion Etching System |
![]() RF Magnetron Sputtering (Oxide) |
![]() RF Magnetron Sputtering (Si-related) |
![]() Furnace Annealing system |
![]() Rapid Thermal Anneal system |
![]() Electron beam deposition system |
![]() Resistive heating vapor deposition system |
![]() UV Ozone system |
![]() High pressure water vapor system |
![]() Supercritical water vapor system |
![]() Glove box |
![]() Mask Aligner/Spin Coater |
![]() Draft Chamber |
![]() Muffle Furnace |
![]() Atomic Layer Deposition |
![]() Laser Doping System |
![]() Carbon Nanotube CVD |
![]() Screen Printing System |
![]() Diamond CVD |
![]() Sputter Coater |
![]() Near-field nano-patterning system |
![]() Ultra pure water supply |
![]() Gas lines (O2, H2, Ar, SF6, CF4) |
![]() Semiconductor Parameter Analyzer |
![]() Prober (Room Temp. and High Temp.) |
![]() Infrared Imaging System |
![]() Digital Microscope |
![]() Spectrophotometer |
![]() Humidity Chamber |
![]() Atomic force microscopy system |
![]() Fourier-transform infrared spectroscopy |
![]() Spectrofluorophotometer |
![]() Four point probe system |
![]() Emission microscope |
![]() Vacuum low temperature prober |
![]() Vacuum light irradiation prober |
![]() Photocurrent / lifetime measuring device |
![]() EBIC-SEM |
![]() Prober (2 units) |
![]() LCR meter |
![]() Scanning tunneling microscope (STM) |
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